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EPG
510 Series
|
•High
sensitivity
•Excellent
thermal resistance
•Excellent
adhesion
•Wide
process margin
|
EPG
510 Series is a high sensitivity and heat
resistance positive photoresist applicable to IC
manufactures.
|
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EPG
535
|
•High
sensitivity
•Excellent
thermal resistance
•Excellent
adhesion
•Wide
process margin
|
EPG
535 is a high resolution and heat
resistance positive photoresist applicable to IC
manufactures.
|
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EPG
590
|
•High
viscosity
•High
transparency
•Excellent
adhesion
•Plating
process application
|
EPG
590 Series is an thick layer positive
photoresist with film thickness 10-30 µm to be
used on Au and Cu plating applicable to bump
manufactures.
|
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EPI
620 series
|
•High
Resolution
•Excellent
thermal resistance
•Excellent
adhesion
•Wide
process margin
|
EPI
620 Series is a high resolution and heat
resistance positive photoresist applicable to IC
manufactures.
|
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EPI
680 series
|
•High
sensitivity
•Wide
process margin
•Excellent
adhesion
|
EPI
680 Series is an I-line positive
photoresist with high sensitivity to be used on
Passivation layer applicable to IC manufactures.
|
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ENPI
202
|
•Excellent
adhesion
•Excellent
strippable
•Based
on safety-solvent
|
ENPI
202 is alkaline developable negative
photoresist suitable for lift-off process.
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EPD
Series
|
•EPD
1000 Non-surfactant High Resolution
•EPD
48 Surfactant High Concentration
|
EPD
1000 Developer Series is a metal ion free
developers recommended for use in
Spray/Puddle/Dipping develop process requiring high
resolution.
EPD
48 is an alkaline base developer, high
concentration, diluted by water before using, can be
applied by Spray/Puddle/Dipping develop process.
|
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ESR
Series
|
•ESR
236 適用於矽片的第1階段、第2階段拋光，可達到極佳的拋光表面，減少最後段精拋成本、並提高良率
•ESR 301 有高速的磨除速度並達到良好的拋光表面，可回收循環使用，在高溫下能保持其穩定性，可用於陶瓷基板晶圓前段拋光
•ESR 303 拋光參數容忍範圍大，可用於前段拋光，亦適合用於最後段的精細拋光，可達到近完美的拋光表面
•ESR 501
不會在鋼材表面造成額外的腐蝕傷害，並可以快速達成鏡面拋光加工
|
ESR
236 適用於矽片的拋光.
ESR
301, ESR 303 適合於Sapphire、LiNbO3
和 LiTaO3.…等晶圓的拋光.
ESR
501 適合於各類不鏽鋼材的鏡面拋光加工.
|
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EPL
336 series
|
•Excellent
coating uniformity
•High
sensitivity with low dark erosion
•Excellent
adhesion
•Excellent
removability
|
EPL
336 series is positive photoresist
with excellent adhesion suitable for TN、STN LCD
production.
|
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EPL
352 series
|
•Excellent
coating uniformity
•Small
dark erosion
•Excellent
surface impedance
•Excellent
adhesion
•Excellent
Strippability
|
EPL
352 series is excellent coating uniformity
and adhesion positive photoresist applicable to
Touch Panel manufactures.
|
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TR
1910 series
|
•High
transmittance & saturation
•High
sensitivity
•Excellent
adhesion
•Good
thermal and chemical resistance
•High
contrast
|
TR
1910A、TG 2910A
and TB 3900A
are high transmittance、contrast and saturation
color resist applicable to transmittive LCD color
filter manufactures.
|
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TR
1940 series
|
•High
transmittance & saturation
•High
sensitivity
•Excellent
adhesion
•Good
thermal and chemical resistance
•High
contrast
|
TR
1940A、TG 2940A
and TB 3940A
are high transmittance、contrast and saturation TFT
color resist applicable to transmittive TFT LCD
color filter manufactures.
|
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EK410
series
|
•High
surface resistivity
•Excellent
surface flatness
•Excellent
adhesion
•Good
thermal and chemical resistance
|
EK
410 Series is a high surface resistivity
carbon black photoresist with good resolution and
optical density. Its low cost compare to chromium
glass substrate is a great advantage to the color
filter manufactures.
|
|
EOC
130 series
|
•Excellent
adhesion
•Excellent
resolution
•Excellent
transparency
•
High surface hardness
•
Excellent adhesion of etching test
•High
sensitivity
•Good
chemical resistance
•Well
development and exposure margin
|
EOC
130 series is a alkaline developable
negative photoresist suitable for photolithography
overcoat photoresist.
|
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ENPD
22 & ENPD 23
|
•Wide
latitude for development process
•Low
foam bubbles formed during process
•Highly
concentrated solution with easy handling
(Because the alkali is concentrated, it must be
diluted the straight developer with DI water before
using, 1:50 for ENPD 22 and 1:100 for ENPD 23.)
|
ENPD
22 & 23 are a highly concentrated
inorganic aqueous alkaline developers. They are
specifically formulated for use with negative type
photoresist, and provide excellent development.
|
|
ENPD
72
|
•Wide
latitude for development process
•Low
foam bubbles formed during process
•Concentrated
buffer solution
(Because the alkali is concentrated, it must be
diluted the straight developer with DI water at the
ratio of 1:19 before use.)
|
ENPD
72 is an inorganic aqueous alkaline
developer that is buffered to increase its shelf
life. It is specifically formulated for use
with negative type photoresist. And it provides
excellent development and high contrast.
|
|
ENPD
80
|
•Wide
latitude for development process
•Low
foam bubbles formed during process
•Highly
concentrated solution with easy handling
(Because the developer is concentrated, it must be
diluted with DI water at the ratio of 1:9 before
using.)
|
ENPD
80 is a highly concentrated inorganic
aqueous alkaline developer that is buffered to
increase its shelf life.It is specifically designed
for negative type photoresist, and provides
excellent development.
|
|
EPT
10 series
|
•Excellent
Solubility Safer Solvent
|
EPT
10 Series is a thinner suitable for
photoresist dilution ,stripping ,back or edge
rinsing .It is formulated with 100% propylene glycol
monomethyl ether acetate ,which is a safer solvent.
|
|
EGC
18
|
•Excellent
cleaning performance
•
Low foaming and fast de-foaming
•
High concentrated
|
EGC
18, an inorganic alkaline water base
detergent, for developer bench and pipe cleaning.
Exhibit better performance when combines with
developer.
|
